NDLI: Magnetic-field properties of high critical current density YBCO films deposited by TFA-MOD

Content Provider	IEEE Xplore Digital Library
Author	Kim, S.B. Murase, S. Yamada, Y. Araki, T. Hirabayashi, I.
Copyright Year	2002
Abstract	The critical current density, Jc, of metal-organic deposition process using trifluoroacetates (TFA-MOD) based YBCO films was measured between 20 K and 77 K in magnetic fields up to 9.5 T as a function of the field direction. C-axis oriented YBCO films was deposited on LaAlO/sub 3/ single crystalline substrates and also on CeO/sub 2/ buffered IBAD (YSZ/Hastelloy) substrates by TFA-MOD method. The obtained Jc values at 77 K and 0 T were 7 and 1.7 MA/cm/sup 2/ for LaAlO/sub 3/ and IBAD substrates, respectively. High Jc values over 10/sup 5/ A/cm/sup 2/ were maintained up to 4 T (B//c-axis) for the LaAlO/sub 3/ substrate and up to 3 T (B//c-axis) for the CeO/sub 2/ buffered IBAD substrate. These results imply that TFA-MOD with simple fabrication process is very promising for the practical YBCO coated conductor. And the dependences on temperature and angular of the Jc at various external magnetic fields for some different thicknesses YBCO films was reported.
Sponsorship	Council on Superconductivity Appl. Superconductivity Conference Inc MIT
Starting Page	2645
Ending Page	2648
Page Count	4
File Size	595569
File Format	PDF
ISSN	10518223
Volume Number	15
Issue Number	2
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-06-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic properties Critical current density Yttrium barium copper oxide Magnetic films Magnetic field measurement Density measurement Current measurement Crystallization Fabrication Conductors YBCO film TFA-MOD thickness
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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