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Content Provider | IEEE Xplore Digital Library |
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Author | Huang, E.Y. Kryder, M.H. |
Copyright Year | 2015 |
Description | Author affiliation: Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA (Huang, E.Y.; Kryder, M.H.) |
Abstract | Ferromagnetic $L1_{0}-ordered$ τ-phase MnAl thin films have been shown to exhibit high perpendicular magnetic anisotropy $(K_{u}$ > $10^{7}$ $ergs/cm^{3}),$ moderate saturation magnetization (M <; 600 $emu/cm^{3}),$ and low Gilbert damping parameter (α = 0.006). x-MnAl is also rare earth- and precious metal-free, making it an attractive candidate for a variety of applications such as magnetic recording, nonvolatile memory technologies, spintronic devices, permanent magnets, etc. However, achieving the necessary $L1_{0}-ordering$ for perpendicular anisotropy in MnAl thin films has proven challenging and highly sensitive to deposition conditions and underlayers used. Using MgO underlayers, we previously demonstrated MnAl thin films with high perpendicular magnetic anisotropy (PMA) on Si substrates for the first time. However, MgO is an insulator, which presents two major challenges. First, MgO must be RF-sputtered, which results in low deposition rates, re-sputtering, and therefore the potential for MgO contamination in undesirable locations. Second, since it is an insulator, MgO impedes the use of MnAl film stacks as the bottom electrode in a magnetic tunnel junction (MTJ) for spintronic applications. |
Starting Page | 1 |
Ending Page | 1 |
File Size | 312031 |
Page Count | 1 |
File Format | |
e-ISBN | 9781479973224 |
DOI | 10.1109/INTMAG.2015.7157550 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2015-05-11 |
Publisher Place | China |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Films Tin Magnetic tunneling Silicon Substrates Saturation magnetization Fabrication |
Content Type | Text |
Resource Type | Article |
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