NDLI: Efficient electromagnetic analysis of spiral inductor patterned ground shields

Content Provider	IEEE Xplore Digital Library
Author	Rautio, J.C. Merrill, J.D. Kobasa, M.J.
Copyright Year	2013
Description	Author affiliation: Sonnet Software, North Syracuse, NY, USA (Rautio, J.C.; Merrill, J.D.; Kobasa, M.J.)
Abstract	Patterned ground shields are widely used to increase the Q of spiral inductors on silicon. As RFIC (radio frequency integrated circuit) technology pushes toward deeper submicron nodes, the geometries of ground shields can become exceedingly complicated. This poses a huge challenge for numerical EM (electromagnetic) simulators. This paper explores several ground shield geometries and illustrates a new anisotropic conducting sheet model for efficient EM analysis of even the most complicated ground shield geometries by substitution of a continuous, but anisotropic conducting sheet. The technique is validated by comparison of EM analysis results using this new model to EM analysis results of actual ground shield geometries. We also explore visualization of the current induced in the silicon substrate by the inductor and (if present) the ground shield.
Starting Page	1
Ending Page	5
File Size	751768
Page Count	5
File Format	PDF
ISBN	9781467357562
DOI	10.1109/COMCAS.2013.6685228
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2013-10-21
Publisher Place	Israel
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Spirals Metals radio frequency integrated circuits Conductivity RFIC Inductors Substrates patterned ground Fingers Anisotropy moment methods CMOS technology Silicon spiral inductors numerical simulation
Content Type	Text
Resource Type	Article

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