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Content Provider | IEEE Xplore Digital Library |
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Author | Eriguchi, K. Kamei, M. Okada, K. Ohta, H. Ono, K. |
Copyright Year | 2008 |
Description | Author affiliation: Grad. Sch. of Eng., Kyoto Univ., Kyoto (Eriguchi, K.; Kamei, M.; Ohta, H.; Ono, K.) |
Abstract | Polarities of plasma charging damage in n- and p-channel MOSFETs with Hf-based high-k gate stack $(HfAlOx/SiO_{2})$ were studied for two different plasma sources (Ar-and Cl-based gas mixtures), and found to depend on plasma conditions, in contrast to those with conventional $SiO_{2}.$ For Ar-plasma, which was confirmed to induce a larger charging damage, both n- and p-ch MOSFETs with high-k gate stacks suffer from negative charge trapping, whereas for Cl-plasma confirmed to induce less damage, both n- and p-ch MOSFETs with high-k gate stacks suffer from positive charge trapping, i.e., the direction of threshold voltage $(V_{t})$ shift depends on plasma sources and a amount of charging damage. From the results of constant-current stress tests, the present unique $V_{t}$ shifts were attributed to the characteristic hole and electron trapping phenomena, implying the necessity of taking the intrinsic charge trapping process into consideration for accurate evaluations of charging damage on high-k gate dielectrics. |
Starting Page | 97 |
Ending Page | 100 |
File Size | 394727 |
Page Count | 4 |
File Format | |
ISBN | 9781424418107 |
DOI | 10.1109/ICICDT.2008.4567255 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2008-06-02 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Threshold voltage MOSFETs High-K gate dielectrics High K dielectric materials Plasma sources Plasma devices Electron traps Dielectric materials Dielectric measurements Capacitance-voltage characteristics constant current stress plasma-induced damage charging SiO2 high-k trap threshold voltage |
Content Type | Text |
Resource Type | Article |
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