NDLI: The prospects for 10 nm III-V CMOS

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2015 International Symposium on VLSI Technology, Systems and Applications

Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)

2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)

Proceedings of Technical Program of 2012 VLSI Technology, System and Application

Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications

Proceedings of 2010 International Symposium on VLSI Technology, System and Application

Innovation in solid state devices for exascale computing

The technical challenges of the future generations of telecommunication technologies (LTE/4G)

A new boom for China's semiconductor industry

Silicon millimeter-wave radios for 60 GHz and beyond

Silicon-based monolithic millimeter-wave integrated circuits

RF/analog and digital faceoff — friends or enemies in an RF SoC

Leading edge foundry Si-based RF technology for wireless communication

Diodes in CMOS for millimeter and sub-millimeter wave circuits

Planar FDSOI technology for sub 22nm nodes

A 30 nm gate-all-around poly-Si nano wire thin-film transistor

A compact, high-speed, and low-power design for multi-pillar vertical MOSFET's, suppressing characteristic influences by process fluctuation

Investigation on the effective immunity to process induced line-edge roughness in silicon nanowire MOSFETs

Single-crystalline Ge p-channel thin-film transistors with Schottky-barrier source/drain on flexible polyimide substrates

Carbon based graphene nanoelectronics technologies

Reducing R in laser annealed enhancement-mode InAs surface channel n-MOSFET

A new step in GeOI pFET scaling and Off-State current reduction: 30nm gate length and record I ratio

Impacts of multiple-gate configuration on characteristics of poly-Si nanowire SONOS devices

Self-aligned shallow trench isolation recess effect on cell performance and reliability of 42nm NAND flash memory

Gate stack etch induced reliability issues in nitrided-based trapping storage cells

Tunnel oxide degradation in TANOS devices and its origin

Investigation of trapping/detrapping mechanisms in Al electron/hole traps and their influence on TANOS memory operations

Hybrid silicon nanocrystals/SiN charge trapping layer with high-k dielectrics for FN and CHE programming

Layered HfSiON-based tunnel stacks for voltage reduction and improved reliability in TANOS memories

Current status of EUV lithography development in Japan

Evaluations for a highly scalable, reliable vertical channel SONOS memory

Electrical characterization of field-enhanced poly-Si nanowire SONOS memory

Material and process challenges for interconnects in nanoelectronics era

Investigation of stability and AC performance of sub-threshold FinFET SRAM

Improved interface characterization technique for high-k/metal gated MugFETs utilizing a gated diode structure

The investigation of the stress-induced traps and its correlation to PBTI in high-kdielectrics nMOSFETs by the RTN measurement technique

On the 60 mV/dec @300 K limit for MOSFET subthreshold swing

Modeling of work-function fluctuation for 16 nm FinFET devices with TiN/HfSiON gate stack

Back-gate mirror doping for fully depleted planar SOI transistors with thin buried oxide

Alternative approaches for high-k/metal gate CMOS: Low temperature process (gate last) and SiGe channel

Synchrotron XPS and EXAFS identification of chemical state and crystal phase changes of HfO films doped with Si, N, Al, and La

Investigation of mechanisms shifting metal effective workfunction towards P+ for various Al incorporation scenarii

Characterization of sub-nm AlO and LaO capping layers on high-k gate stack film systems using VuV (λ=120 nm) reflectivity

Power, cost and circuit IP reuse: The real limiter to Moore's Law over the next 10 years

Investigation of ALD or PVD (Ti-rich vs. N-rich) TiN metal gate thermal stability on HfO high-K

Integration of ALD AlN work function tuning layers

Thermo-mechanical stress characterization of tungsten-fill through-silicon-via

3D Integration technology for energy efficient system design

Verifying thermal/thermo-mechanical behavior of a 3D stack — challenges and solutions

Via mid through silicon vias — the manufacturability outlook

ThruChip Interface for 3D system integration

Challenges and opportunities of extremely thin SOI (ETSOI) CMOS technology for future low power and general purpose system-on-chip applications

Multi-V engineering in highly scaled CMOS bulk and FinFET devices through Ion Implantation into the metal gate stack featuring a 1.0nm EOT high-K oxide

Segmented tri-gate bulk CMOS technology for device variability improvement

Key sub 1nm EOT CMOS enabler by comprehensive PMOS design

Localized SOI logic and bulk I/O devices co-integration for Low power System-on-Chip technology

Palladium incorporated nickel silicide for a cost effective alternative salicide technology for scaled CMOS

Variation; key issue of the advanced CMOS & LSI's

Variability analysis of TiN FinFET SRAM cell performance and its compensation using Vth-controllable independent double-gate FinFET

Hole band anisotropy effect on ON-state performance of biaxial compressive strained SiGe-based short channel QW pMOSFETs: Experimental observations

Bit Cost Scalable (BiCS) flash technology for future ultra high density storage devices

Comprehensively study of read disturb immunity and optimal read scheme for high speed HfOx based RRAM with a Ti layer

Low current bipolar resistive switching memory using Cu metallic filament in Ge solid-electrolyte

Ultra-low power Al-based RRAM with 1μA reset current

Silicides as new electrode/heater for compact integration of phase change memory with CMOS

Effect of anodic interface layers on the unipolar switching of HfO-based resistive RAM

Investigations of performance enhancement in a poly-Si nanowire FET featuring independent double-gated configuration and its nonvolatile memory applications

Identification and application of current compliance failure phenomenon in RRAM device

Scalability with silicon nitride encapsulation layer for Ti/HfOx pillar RRAM

Shaping interconnect technology for an interconnected society

A new self-aligned contact technology for III-V MOSFETs

Effective Schottky Barrier lowering for contact resistivity reduction using silicides as diffusion sources

Strain engineering in nanoscale CMOS FinFETs and methods to optimize R

Wafer-on-wafer (WOW) stacking with damascene-contact TSV for 3D integration

An extensive study for the impacts of structure-wise TSVs on position-oriented MOSFETs with TSV signal disturbance

Investigations of Cu bond structures and demonstration of a wafer-level 3D integration scheme with W TSVs

The prospects for 10 nm III-V CMOS

Fast switching power semiconductor devices and Smart Power IC´s: An enabling technology for future high efficient electronic system

GaN-on-Si power field effect transistors

Nano-electronics of high k dielectrics on exotic semiconductors for science and technology beyond Si CMOS

2009 International Symposium on VLSI Technology, Systems, and Applications

2008 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)

2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)

2006 International Symposium on VLSI Technology, Systems, and Applications

IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech).

2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672)

2001 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers (Cat. No.01TH8517)

1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)

Proceedings of Technical Papers. International Symposium on VLSI Technology, Systems, and Applications

1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers

1993 International Symposium on VLSI Technology, Systems, and Applications Proceedings of Technical Papers

1991 International Symposium on VLSI Technology, Systems, and Applications - Proceedings of Technical Papers

International Symposium on VLSI Technology, Systems and Applications,

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