NDLI: Modeling of defect propagation/growth for in-line defect inspection optimization in VLSI fabrication

Content Provider	IEEE Xplore Digital Library
Author	Xiaolei Li Strojwas, A. Reddy, M. Milor, L. Lin, Y.T.
Copyright Year	1997
Description	Author affiliation: Carnegie Mellon Univ., Pittsburgh, PA, USA (Xiaolei Li)
Abstract	Particulate contamination deposited on silicon wafers is typically the dominant reason for yield loss in VLSI manufacturing. The transformation of contaminating particles into defects and then electrical faults is a very complex process which depends on the defect location, size, material and the underlying IC topography. A rigorous 2D topography simulator METROPOLE, has been developed to allow the prediction and correlation of the critical physical parameters (material, size and location) of contamination in the manufacturing process to device defects. The results for a large number of defect samples simulated using the above approach were compared with data gathered from the AMD-Sunnyvale fabline. A good match was obtained indicating the accuracy of this method which provided a framework for developing contamination to defect propagation/growth macromodels. We have demonstrated that the understanding of defect transformation can be applied to optimizing wafer inspection sampling strategy.
Starting Page	36
Ending Page	39
File Size	467876
Page Count	4
File Format	PDF
ISBN	0780337379
DOI	10.1109/IWSTM.1997.629408
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1997-06-08
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Inspection Contamination Atmospheric modeling Surfaces Semiconductor device modeling Silicon Very large scale integration Predictive models Manufacturing processes Sampling methods
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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