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Content Provider | IEEE Xplore Digital Library |
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Author | Tsai, C.F. Su, Y.K. Lin, C.L. |
Copyright Year | 2009 |
Description | Author affiliation: Department of Electronic Engineering, Kun-Shan University, Yung-Kang City, Tainan 710, Taiwan, R.O.C. (Lin, C.L.) || Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University Tainan 701, Taiwan, R.O.C. (Su, Y.K.) || Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, No. 1 University Road, Tainan 701, Taiwan, R.O.C. (Tsai, C.F.) |
Abstract | GaN-based wide bandgap semiconductors have recently attracted considerable interests, in terms of applications for optoelectronic devices, which operate in the blue, green, and ultraviolet (UV) wavelength regions [1]. A general configuration of GaN-based LEDs is that both n- and p-type pads are formed on the same side of the LED chip due to the insulating sapphire substrates. In such a structure, the p electrode is located in the middle of the light path, some loss of light is inevitable as a result of photon absorption near the p-pad [2]. Therefore, in order to increase the light output of GaN-based LEDs, the issue of light absorption at p-pad will be important. Recently, several current blocking (CB) methods that could enhance the light output of LEDs have been demonstrated as follows: using CF gases plasma-treatment to p-GaN under p-pad for current blocking [3]; forming and varying the number and size of blocking-holes in the shortest current path between p-pad and n-pad [4]; inserting an insulator in p-GaP layer under p-pad for the current blocking application of AlGaInP-based material system [5]; localized Ti deposition associated with indium-zinc-oxide (IZO) was proposed to serve as a Schottky current blocking layer for the vertical-structure GaN-based LEDs [6]; the activation of Mg-doped p-GaN using a Ni film as the catalyst to form the selective high resistivity region (SHRR) as the purpose of current blocking [7], etc. In this article, through the one-step selective area current blocking design without additional steps to form current blocking structure as above mentioned in the literature, we could define a Schottky contact region under the p-pad to avoid spontaneous emission beneath the opaque p-pad, thus enhancing an additional current injection into the effective active layers of the LED, thereby significantly increasing the light output power. |
Starting Page | 1 |
Ending Page | 2 |
File Size | 684903 |
Page Count | 2 |
File Format | |
ISBN | 9781424460304 |
DOI | 10.1109/ISDRS.2009.5378200 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2009-12-09 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Light emitting diodes Indium tin oxide Power generation Microelectronics Cities and towns Absorption Plasma applications Schottky barriers Chemicals Educational institutions |
Content Type | Text |
Resource Type | Article |
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