NDLI: Large-scaled line plasma production by evanescent microwave in a narrowed rectangular waveguide

Content Provider	IEEE Xplore Digital Library
Author	Shindo, H. Kimura, Y. Sato, N. Suzuki, M.
Copyright Year	2008
Description	Author affiliation: Dept. of Inf. Telecommun. & Electron., Tokai Univ., Hiratsuka, Japan (Shindo, H.; Kimura, Y.; Sato, N.; Suzuki, M.)
Abstract	Long line-shaped plasmas are inevitable in material processing in manufacturing industries, such as flat panel displays (FPDs) and surface modification of large-area thin films. In this work, we studied a newly proposed method of large-scaled line plasma generation. In this method, microwave power of frequency of 2.45 GHz in a narrowed and flattened rectangular waveguide is employed to produce a long uniform line plasma. Since the width of waveguide is very close to the cutoff condition, the wavelength of microwave inside the guide is very much lengthened, providing a condition of long uniform line plasma generation. The narrowed rectangular waveguides of 1.0 and 1.5 m in length and 5 mm in height were examined. The width of the waveguide could be varied from 59 to 61 mm. The waveguide has a long slot of 5 mm width on the top surface to launch the microwave into the discharge plasma chamber. The plasmas of Ar nad He at the pressures of 100 mTorr were generated by employing an extremely long microwave wavelength. It was observed that the microwave electric field became more uniform as the wave guide width was narrowed, indicating that the plasma production is due to the mechanism expected. The optical emission line measurements in Ar and He plasmas also confirmed that the uniform plasma was produced in the entire region of 1 m and 1.5 m. Thus we conclude that the present method of plasma production is quite advantageous for large area processing. Plasma extraction was also successfully tested and further long line plasma of 2 meter is now under consideration.
Starting Page	417
Ending Page	420
File Size	2655760
Page Count	4
File Format	PDF
ISBN	9780955805202
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2008-09-07
Publisher Place	UK
Access Restriction	Subscribed
Rights Holder	GD2008 Local Organizing Committee
Subject Keyword	Plasma materials processing Plasma applications Rectangular waveguides Production Plasma measurements Plasma displays Microwave generation Optical waveguides Plasma waves Optical surface waves
Content Type	Text
Resource Type	Article

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