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Content Provider | IEEE Xplore Digital Library |
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Author | Kraus, S. Sexl, M. Bohm, G. Trankle, G. Weimann, G. |
Copyright Year | 1998 |
Description | Author affiliation: Walter Schottky Inst., Tech. Univ. Munchen, Garching, Germany (Kraus, S.) |
Abstract | Delta-doped InAlAs/InGaAs-HEMTs were grown by MBE, lattice matched on InP-substrates. The ratio of upper doping to lower doping was varied from 1:0, 4:1, 2:1, 1:1 to 0:1, while total doping concentration was kept constant. By increasing the bottom doping concentration, the drain current is increased and the kink effect reduced. Ultimately the inversely doped transistor shows absolutely no kink and a very low output conductance of 25 mS/mm. These new results offer a better understanding of the kink effect, related to the band structure of the HEMTs and its dependence on doping. |
Starting Page | 503 |
Ending Page | 506 |
File Size | 263401 |
Page Count | 4 |
File Format | |
ISBN | 0750305568 |
DOI | 10.1109/ISCS.1998.711725 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1997-09-08 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Doping Indium compounds Indium gallium arsenide HEMTs MODFETs Charge carrier density Electrons Indium phosphide Substrates Etching |
Content Type | Text |
Resource Type | Article |
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