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Content Provider | IEEE Xplore Digital Library |
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Author | Berghoff, B. Rolver, R. Batzner, D. L. Spangenberg, B. Kurz, H. Dimyati, A. Sologubenko, A. Mayer, J. |
Copyright Year | 2008 |
Description | Author affiliation: Central Facility for Electron Microscopy, RWTH Aachen University, Ahornstraße 55, 52074, Germany (Dimyati, A.; Sologubenko, A.; Mayer, J.) || Institute of Semiconductor Electronics, RWTH Aachen University, Sommerfeldstr. 24, 52074, Germany (Berghoff, B.; Rolver, R.; Batzner, D. L.; Spangenberg, B.; Kurz, H.) |
Abstract | Crystallized Si QWs embedded between SiO barrier layers were fabricated by remote plasma enhanced chemical vapor deposition of Si/SiO and Si/SiO stacks and subsequent high temperature annealing. Using SiO instead of SiO strongly enhances the overall crystallinity and the nanocrystallite size of the Si QWs. The phase separation of the SiO into Si and SiO increases the thickness of the Si QWs and yields thin SiO barriers. Photoluminescence measurements on annealed stacks showed a quantum confinement of carriers within the Si QWs. The high degree of crystallization and the decrease of SiO barrier height and thickness as well as possible shunting between adjacent Si layers improve the conductivity of annealed Si/SiO stacks by up to seven orders of magnitude compared to Si/SiO stacks. |
Starting Page | 1 |
Ending Page | 4 |
File Size | 2864305 |
Page Count | 4 |
File Format | |
ISBN | 9781424416400 |
ISSN | 01608371 |
DOI | 10.1109/PVSC.2008.4922499 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2008-05-11 |
Publisher Place | USA |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Silicon Crystallization Annealing Plasma confinement Plasma temperature Plasma chemistry Plasma transport processes Chemical vapor deposition Photoluminescence Potential well |
Content Type | Text |
Resource Type | Article |
Subject | Industrial and Manufacturing Engineering Electrical and Electronic Engineering Control and Systems Engineering |
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