NDLI: A novel approach to dual damascene patterning

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A novel approach to dual damascene patterning

Content Provider	IEEE Xplore Digital Library
Author	Hussein, M. Sivakumar, S. Brain, R. Beattie, B. Nguyen, P. Fradkin, M.
Copyright Year	2002
Description	Author affiliation: Portland Technol. Dev., Intel Corp., Hillsboro, OR, USA (Hussein, M.; Sivakumar, S.; Brain, R.; Beattie, B.; Nguyen, P.; Fradkin, M.)
Abstract	In this paper, we present and discuss a novel approach to dual damascene patterning based on the invention of SLAM (Sacrificial Light Absorbing Material). We will focus on dual damascene patterning problems that led to the invention of SLAM, and present a side-by-side comparison of the patterning performance of SLAM-assisted dual damascene patterning and a Bottom Anti-Reflective Coating (BARC), the industry's primary approach. SLAM-assisted dual damascene patterning is an enabling technology for Intel's 130 nm technology and beyond.
Starting Page	18
Ending Page	20
File Size	238205
Page Count	3
File Format	PDF
ISBN	0780372166
DOI	10.1109/IITC.2002.1014874
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2002-06-05
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Simultaneous localization and mapping Reflectivity Dry etching Coatings Space technology Dielectric substrates Resists Dielectric materials Polymers Absorption
Content Type	Text
Resource Type	Article

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