NDLI: Microfluidic channels fabricated by femtosecond laser irradiation and chemical etching for optofluidic devices.

Content Provider	IEEE Xplore Digital Library
Author	Vishnubhatla, K.C. Clark, J. Lanzani, G. Ramponi, R. Osellame, R. Virgili, T.
Copyright Year	2009
Description	Author affiliation: Istituto di Fotonica e Nanotecnologie - CNR and Dipartimento di Fisica - Politecnico di Milano, Piazza Leonardo da Vinci, 32, 20133, Milano, Italy (Vishnubhatla, K.C.; Clark, J.; Lanzani, G.; Ramponi, R.; Osellame, R.; Virgili, T.)
Abstract	In the field of organic optoelectronics, optofluidic approach is gaining importance to take advantage of useful properties of polymers in solutions. In tune with it, many researchers are moving from fundamental research in cuvettes to original geometries like microfluidic channels for device applications [1]. Microfluidic channels and patterns can be fashioned by lithographic and chemical-etching techniques, but these approaches are primarily limited to the fabrication of two-dimensional patterns on the surface. In order to create a true 3-D structure several layers of glass substrates need to be patterned, etched and fused together. A relatively new technique of Femtosecond Laser Irradiation and Chemical Etching (FLICE) can add nuance to these fabrication approaches and, thereby, permit the development of directly buried microchannels with various aspect ratios. As this is a maskless technology, it enables rapid prototyping of new devices. Moreover, since the same femtosecond laser can be used to produce low loss optical waveguides [2], these femtosecond laser based technologies could become one-stop solution for fabrication of microfluidic channels and their integration with optical circuits [3].
Starting Page	1
Ending Page	1
File Size	101207
Page Count	1
File Format	PDF
ISBN	9781424440795
DOI	10.1109/CLEOE-EQEC.2009.5196493
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-06-14
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Optical design Microchannel Optical device fabrication Chemical lasers Etching Laser ablation Ultrafast optics Optical amplifiers Microfluidics Optical polymers
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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